Oxide Based Electronics: A Coming Technology Elvira Fortunato Departamento de Ciência dos Materiais, Universidade Nova de Lisboa and CEMOP/Uninova, Caparica, Portugal Transparent electronics are now a reality and are adding new electronic functionalities onto surfaces. High-‐ performance n-‐ and p-‐type Thin Film Transistors (TFTs), prepared by physical vapor deposition (PVD) techniques have already been developed. PVD processes like rf magnetron sputtering can be performed near room temperature, which makes them compatible with the use of temperature sensitive, low-‐cost flexible substrates (polymers, cellulose paper, among others). Besides that, tremendous advances are coming through liquid solution-‐ based technologies, which is very exciting for ink-‐jet printing, where the theoretical limitations are becoming practical limitations. In this presentation, some of the most promising new technologies for n-‐ and p-‐type thin film transistors based on oxide semiconductors and their current and future applications will be reviewed. Some of the most promising new technologies for n-‐ and p-‐type thin film transistors are in the form of nano-‐films or nanoparticles. Special emphasis will be given to solution-‐processes. A summary of the major milestones already achieved with this emerging and very promising technology will be presented.
